Article
Nanodiamond Synthesis and Characterization, as Well as Its Use as an Anti-Polishing Agent on Sio2 Substrate
Authors
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Abstract
Nanodiamond particles were produced, purified, and described in the current work. The surface of the nanodiamond was then oxidised to create a uniform coating of COOH groups. Finally, the functionalized particles were placed on the SiO2 substrate and their anti-polishing properties were studied. FT-TR, TGA, TEM, and SEM were used to characterise the products of this study
Keywords
Nanodiamond, Surface modification, SiO2-based substrate
Citation
Das, D., Venkatesan, S., & A, K. (2019). Nanodiamond synthesis and characterization, as well as its use as an anti-polishing agent on Sio2 substrate. Turkish Journal of Computer and Mathematics Education, 10(3), 1195–1202.
D. Das, S. Venkatesan and K. A, “Nanodiamond synthesis and characterization, as well as its use as an anti-polishing agent on Sio2 substrate,” Turkish Journal of Computer and Mathematics Education, vol. 10, no. 3, pp. 1195–1202, 2019.
Das D, Venkatesan S, A K. Nanodiamond synthesis and characterization, as well as its use as an anti-polishing agent on Sio2 substrate. Turkish Journal of Computer and Mathematics Education. 2019;10(3):1195–1202.
Das, D., Venkatesan, S. and A, K. (2019), ‘Nanodiamond synthesis and characterization, as well as its use as an anti-polishing agent on Sio2 substrate’, Turkish Journal of Computer and Mathematics Education, 10(3), pp. 1195–1202.
Das, Durlab, et al. “Nanodiamond Synthesis and Characterization, as Well as Its Use as an Anti-polishing Agent on Sio2 Substrate.” Turkish Journal of Computer and Mathematics Education, vol. 10, no. 3, 2019, pp. 1195–1202.
Das, Durlab, S. Venkatesan, and Karthik A. “Nanodiamond Synthesis and Characterization, as Well as Its Use as an Anti-polishing Agent on Sio2 Substrate.” Turkish Journal of Computer and Mathematics Education 10, no. 3 (2019): 1195–1202.
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Published by: Engineering Journals
