International Journal of New Horizons in Physics
Journal license

Journal

International Journal of New Horizons in Physics


Volume
& Issue

Volume 3, Issue 1


Published
on

January 1, 2016


Pages

11-16


DOI

Article

Effect of Energetic Argon Ion Irradiation on Microstructure Parameters, Thickness and Refractive Index of ZnSe Films

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Authors

E. R. Shaaban* Affiliation:
Department of Physics, Faculty of Science, Al-Azhar University, Assuit, Egypt
, F. Diab Affiliation:
Plasma and Nuclear Fusion Department, Nuclear Research Center, Atomic Energy Authority, Egypt
and Gamal El-Kashef Affiliation:
Plasma and Nuclear Fusion Department, Nuclear Research Center, Atomic Energy Authority, Egypt


Abstract

The effect of distance of energetic argon ion irradiation is studied on ZnSe stoichiometric film having compressive lattice strain and improve the refractive index. An increase in grain size and decrease in lattice strain was observed with decreasing irradiation distance (or increasing ion energy). The decrease in distance of energetic argon ion irradiation can effectively improve the transmittance. Both of film thickness and refractive index were calculated in terms of Swanepoel's method with high precision. The film thickness and refractive index of ZnSe thin films decrease with increasing the energetic argon ion irradiation i.e. decrease the distance between the anode and the sample.


Keywords

ZnSe, thin film, XRD, irradiation distance, Plasma focusing


Citation

Shaaban, E. R., Diab, F., & El-Kashef, G. (2016). Effect of energetic argon ion irradiation on microstructure parameters, thickness and refractive index of znse films. International Journal of New Horizons in Physics, 3(1), 11–16. https://doi.org/10.18576/ijnhp/030103

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